Mentoring on the ANSYS Family of Products

What is it?

Mentoring goes beyond TECS (technical support) by giving you access to experienced engineers who not only will help you with the ANSYS family of products, but can help with advice on making engineering decisions. It goes beyond training by helping you use your analysis tools to solve your specific problems with your own parts. Mentoring can be one-on-one at your facility, at our facility, over the phone, via email, or any combination of these.

Why might I need it?

In many cases we can help you to do things better, faster, and cheaper. We get you up the learning curve, most likely faster than you could on your own. We can help you take advantage of the latest ANSYS Product offerings, including Workbench, CFX, AI*Environment, Paramesh, and DesignXplorer, as well help you become proficient with the proven traditional ANSYS technology.

How much does it cost?

You should contact us for pricing as it can vary based on your needs. Typically we contract for mentoring in blocks of hours or days. We’re confident your company will save money in the long run as you’ll be a more efficient analyst after going through mentoring.

What do our customers say about it?

“With your help, I was able to complete my task on time. That means, I could not have done it without your help.”

“Most of the questions have been very simple in nature but, like most things in ANSYS, can be very time consuming if you don't know the right command or exactly how it is intended to be used. In all cases, [PADT’s engineer] has done a great job of answering the questions. He is extremely knowledgeable about both the tool and has a very good understanding of the mechanics involved with the types of problems we work on.”

“I'd like to take this opportunity to express my personal appreciation for PADT’s [mentoring] on ANSYS [and] how critical their service was for me to finish my … analysis on time.”

How do I find out more?

Send an email to ted.harris@padtinc.com or call Ted Harris at 480-813-4884.

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